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Dependence of interface roughness and diffuseness of Cu-Co electrodeposited multilayers on electrochemical additives

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Publication Type:

Journal Article

Authors:

Merkourakis, S.; Hytch, M. J.; Chassaing, E.; Walls, Michael; Leprince-Wang, Y.

Source:

Journal Of Applied Physics, Amer Inst Physics, Volume 94, Number 5, p.3035–3040 (2003)