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Self-sustained etch masking: A general concept to initiate the formation of nanopatterns during ion erosion

Posted in

Publication Type:

Journal Article

Authors:

Le Roy, S.; Barthel, E.; Brun, Nathalie; Lelarge, A.; Sondergard, E.

Source:

Journal Of Applied Physics, Volume 106, Number 9, p.094308 (2009)