Skip to main content

X-ray diffraction analysis of thermally-induced stress relaxation in ZnO films deposited by magnetron sputtering on (100) Si substrates

Posted in

Publication Type:

Journal Article


Conchon, F.; Renault, P. O.; Goudeau, P.; Le Bourhis, E.; Sondergard, E.; Barthel, E.; Grachev, S.; Gouardes, E.; Rondeau, V.; Gy, R.; Lazzari, R.; Jupille, J.; Brun, Nathalie


Thin Solid Films, Volume 518, Number 18, p.5237–5241 (2010)