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X-ray diffraction analysis of thermally-induced stress relaxation in ZnO films deposited by magnetron sputtering on (100) Si substrates

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Publication Type:

Journal Article

Authors:

Conchon, F.; Renault, P. O.; Goudeau, P.; Le Bourhis, E.; Sondergard, E.; Barthel, E.; Grachev, S.; Gouardes, E.; Rondeau, V.; Gy, R.; Lazzari, R.; Jupille, J.; Brun, Nathalie

Source:

Thin Solid Films, Volume 518, Number 18, p.5237–5241 (2010)