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X-ray diffraction study of thermal stress relaxation in ZnO films deposited by magnetron sputtering

Posted in

Publication Type:

Journal Article

Authors:

Conchon, F.; Renault, P. O.; Le Bourhis, E.; Krauss, C.; Goudeau, P.; Barthel, E.; Grachev, S. Yu.; Sondergard, E.; Rondeau, V.; Gy, R.; Lazzari, R.; Jupille, J.; Brun, Nathalie

Source:

Thin Solid Films, Volume 519, Issue 5, p.1563 - 1567 (2010)

DOI:

10.1016/j.tsf.2010.07.013
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